Effect of deposition time on structural, electrical, and optical properties of SnS thin films deposited by chemical bath deposition


GÜNERİ E., Ulutas C., Kirmizigul F., Altindemir G., Gode F., GÜMÜŞ C.

APPLIED SURFACE SCIENCE, vol.257, no.4, pp.1189-1195, 2010 (SCI-Expanded) identifier identifier

  • Publication Type: Article / Article
  • Volume: 257 Issue: 4
  • Publication Date: 2010
  • Doi Number: 10.1016/j.apsusc.2010.07.104
  • Journal Name: APPLIED SURFACE SCIENCE
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.1189-1195
  • Keywords: SnS, Thin film, Chemical bath deposition, SPRAY-PYROLYSIS, SUBSTRATE-TEMPERATURE, DEPENDENCE, COPPER, ELECTRODEPOSITION, GROWTH
  • Çukurova University Affiliated: Yes

Abstract

The effect of deposition time on the structural, electrical and optical properties of SnS thin films deposited by chemical bath deposition onto glass substrates with different deposition times (2, 4, 6, 8 and 10 h) at 60 degrees C were investigated. The obtained films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-ray analysis (EDX) and optical absorption spectra. All deposited films were polycrystalline and had orthorhombic structure with small crystal grains. Their microstructures had changed with deposition time, and their compositions were nearly stoichiometric. Electrical parameters such as resistivity and type of electrical conduction were determined from the Hall Effect measurements. Hall Effect measurements show that obtained films have p-type conductivity and resistivity values of SnS films have changed with deposition time. For allowed direct, allowed indirect, forbidden direct and forbidden indirect transitions, band gap values varied in the range 1.30-1.97 eV, 0.83-1.36 eV, 0.93-1.49 eV and 0.62-1.23 eV, respectively. (C) 2010 Elsevier B. V. All rights reserved.