Thickness dependence of the L-2,L-3 branching ratio of Cr thin films

Aksoy F., Akgul G., UFUKTEPE Y. , Nordlund D.

JOURNAL OF ALLOYS AND COMPOUNDS, cilt.508, ss.233-237, 2010 (SCI İndekslerine Giren Dergi) identifier identifier

  • Cilt numarası: 508 Konu: 2
  • Basım Tarihi: 2010
  • Doi Numarası: 10.1016/j.jallcom.2010.07.100
  • Sayfa Sayıları: ss.233-237


We report the electronic structure of chromium (Cr) thin films depending on its thickness using two measures, total electron yield (TEY) and transmission yield mode. The Cr L edge X-ray absorption spectroscopy (XAS) spectrum shows strong thickness dependence with broader line widths observed for L-2,L-3 edge peaks for thinner films. The white line ratio (L-3/L-2) was found to be 1.25 from the integrated area under each L-3 and L-2 peak and 1.36 from the ratio of the amplitudes of each L-3 and L-2 peak after the deconvolution. Additionally, we show that full-width at half-maximum (FWHM) at the L-2 and L-3 edges and the branching ratio of Cr change as a function of film thickness and these are discussed in detail. Using L-2,L-3 resonance intensity variation as a function of film thickness we calculated the electron escape depth and X-ray attenuation length in Cr. Comparing our results with the literature, there was good agreement for the L-3-L-2 ratio although the detailed shape can show additional solid state and atomic effects. (c) 2010 Elsevier B.V. All rights reserved.