Extremely low-cost electrodeposition technique was developed to deposit ZnO nanorods. The growth process was performed using standard DC power supply, milliammeter and two-electrode electrochemical cell. The deposition was carried out on indium tin oxide (ITO) coated glass substrates by changing deposition parameters such as cathodic deposition current and time, solution molarity and temperature. The parameters varied to obtain optimum transparent semiconductor material for optoelectronic applications. Structural characterizations by X-ray diffraction (XRD) indicate the formation of polycrystalline phase ZnO with strong c-axis orientation and were sensitive to deposition temperatures and molarity as well. Average optical transmittance for the best two ZnO nanorod serieswas around 60% and 42%, respectively. The optical energy band gap of the ZnO nanorods decreased from 3.24 eV to 3.21 eV as the deposition time increased. All the nanorods were n-type with a high carrier concentration of 1 x 10(20) cm(-3) and low 1-2 x 10(-3) Omega cm resistivity. (C) 2015 Elsevier B.V. All rights reserved.